| Facility | BL | Light source | Photon Energy (eV) | Energy Resolution | Photon Flux | Beam Size at Sample (mm2) | Note | |
|---|---|---|---|---|---|---|---|---|
| KEK-PF | BL-1C | bending | 20 ~ 240 | 1000 ~ 10000 | 1011~109 | 1 x 1 | VUV and soft X-ray photoelectron spectroscopy | |
| BL-2C | undulator | 250 ~ 1400 | 5000 ~ 10000 | 1011~1010 | 0.9 X 0.1 | Soft X-ray spectroscopy | ||
| BL-3B | bending | 10 ~ 280 | 200 ~ 3000 | 1012 ~ 109 | < 2fai | VUV and soft X-ray spectroscopy | ||
| BL-7A (RCS) |
bending | 50 ~ 1500 | 1000 ~ 9000 | 1012 ~ 109 | 2.5 x 0.5 | Soft X-ray XAFS, XMCD, XPS | ||
| BL-8A (Hitachi) |
bending | 38 ~ 2300 | 2000 | ~ 1010 | 5 x 1 | Soft X-ray spectroscopy | ||
| BL-11A | bending | 70 ~ 1900 | 500 ~ 5000 | 1012 ~ 109 | 2 x 1 | Soft X-ray spectroscopy | ||
| BL-11D | bending | 60 ~ 900 | 2000 | ~ 1011 | 1 x 0.1 | VUV and soft X-ray photoelectron spectroscopy for solids | ||
| BL-12A | bending | 30 ~ 1000 | 1000 | ~ 109 | 2 x 3 | Characterization of VUV-SX optical elements, soft X-ray spectroscopy | ||
| BL-13C | undulator | 70 ~ 1000 | 1000 ~ 6000 | 1012 ~ 1010 | 5 x 1 | Soft X-ray photoelectron spectroscopy and XAFS | ||
| BL-16B | undulator | 40 ~ 550 | 1000 ~ 10000 | 1012 ~ 1010 | < 1fai | Soft X-ray spectroscopy | ||
| BL-18A (ISSP) |
bending | 15 ~ 150 | 1000 ~ 2000 | 1011 ~ 109 | < 1fai | Angle-resolved photoelectron spectroscopy of surfaces and interfaces | ||
| BL-19A (ISSP) |
Revolver undulator | 12 ~ 250 | 1000 | ~ 1012 | < 0.7fai | Spin-resolved photoelectron spectroscopy (Mott detector) | ||
| BL-19B (ISSP) |
Revolver undulator | 10 ~ 1200 | 400 ~ 4000 | 1012 ~ 1011 | <0.5fai | Spin-resolved photoelectron spectroscopy (SPLEED), Soft X-ray emission spectroscopy | ||
| BL-28A | Helical undulator | 30 ~ 250 | 1000 | ~ 1010 | < 0.5fai | VUV and soft X-ray spectroscopy with circularly polarized undulator radiation | ||
| AR-NE1B | Helical undulator | 250 ~ 1800 | 1000 ~ 5000 | 1011 ~ 109 | ~0.8 x 0.2 | Spectroscopy with circularly polarized soft X-rays | ||
| UVSOR | BL1A | bending | 600 ~ 4000 | ~ 1500 | 1010 ~ 107 | Soft X-ray spectroscopy | ||
| BL1B | bending | 2 ~ 40 | ~ 1000 | ~ 1010 | VUV reflection, absorption, emission | |||
| BL2B2 | bending | 20 ~ 200 | 2000 ~ 8000 | 1010 ~ 109 | Soft X-ray spectroscopy | |||
| BL3U | undulator | 80 ~ 500 | > 5000 | Soft X-ray emission spectroscopy | ||||
| BL3B | bending | 6 ~ 40 | ~14000 | Soft X-ray spectroscopy | ||||
| BL4B | bending | 75 ~ 1000 | > 5000 | 1010 ~ 107 | Soft X-ray spectroscopy | |||
| BL5U | helical undulator | 5 ~ 250 | 2000 ~ 10000 | 1012 ~ 109 | < 0.5fai | Angle-resolved photoelectron spectroscopy for solids | ||
| BL5B | bending | 6 ~ 600 | ~ 500 | 1011 ~ 109 | 1 x 3 | Instruments' calibration | ||
| BL7B | bending | 1.2 ~ 30 | 4000 ~ 8000 | 1011 ~ 109 | < 1fai | VUV reflection, absorption, emission | ||
| BL8B1 | bending | 30 ~ 800 | 3000 ~ 4000 | 109 ~ 106 | Soft X-ray spectroscopy | |||
| BL8B2 | bending | 2 ~ 150 | ~ 4000 | 1011 ~ 109 | Angle-resolved photoelectron spectroscopy for organic thin films | |||
| SPring-8 | BL17SU | undulator | ||||||
| BL23SU | APPLE-II undulator | 300 ~ 1500 | > 10000 | > 1011 | 0.1 ~ 1 | Surface chemistry station, Electron paramagnetic resonance on biological molecule station, Photoelectron spectroscopy station, Magnetic circular dichroism station | ||
| BL25SU | twin helical undulator | 500 ~ 3000 | > 10000 | > 1011 | < 2 | High resolution photoemission, Photoelectron diffraction and holography, Magnetic circular dichroism in the core absorption (MCD) | ||
| BL27SU | figure8 undulator | 170 ~ 5800 | > 10000 | > 1011 | Industrial research, Atomic and molecular spectroscopy, Surface analysis and solid state physics | |||
| HiSOR | BL1 | undulator | 26 ~ 300 | photoelectron spectroscopy for solids | ||||
| BL9 | helical undulator | 4 ~ 40 | photoelectron spectroscopy for solids | |||||